Hits:
Title of Paper:Effects of Recess Depths on Performance of AlGaNGaN Power MIS-HEMTs on the Si Substrates and Threshold Voltage Model of Different Recess Depths for the Using HfO2 Gate Insulator
Journal:Solid State Electronics
Indexed by:Letter
Document Code:SCI:000496807500007
Discipline:Engineering
Volume:"Vol,163,
Issue:107649
Page Number:pp:1-6"
Translation or Not:no
Date of Publication:2020-05-14
Included Journals:SCI
Pre One:Comparative Study of Characteristics and Interface States with and without Post-Gate-Annealing Treatment for AlGaN/GaN-Recessed Metal–Insulator–Semiconductor High Electron Mobility Transistors Using HfO2 Gate Insulator on Si Substrates
Next One:Low ohmic-contact resistance in AlGaN/GaN high electron mobility transistors with holes etching in ohmic region