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Effects of Recess Depths on Performance of AlGaNGaN Power MIS-HEMTs on the Si Substrates and Threshold Voltage Model of Different Recess Depths for the Using HfO2 Gate Insulator

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Title of Paper:Effects of Recess Depths on Performance of AlGaNGaN Power MIS-HEMTs on the Si Substrates and Threshold Voltage Model of Different Recess Depths for the Using HfO2 Gate Insulator

Journal:Solid State Electronics

Indexed by:Letter

Document Code:SCI:000496807500007

Discipline:Engineering

Volume:"Vol,163,

Issue:107649

Page Number:pp:1-6"

Translation or Not:no

Date of Publication:2020-05-14

Included Journals:SCI

Pre One:Comparative Study of Characteristics and Interface States with and without Post-Gate-Annealing Treatment for AlGaN/GaN-Recessed Metal–Insulator–Semiconductor High Electron Mobility Transistors Using HfO2 Gate Insulator on Si Substrates

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