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Affiliation of Author(s):微电子学院

Title of Paper:Interfacial and electrical characterization of HfO2/Al2O3/InAlAs structures

Journal:JAPANESE JOURNAL OF APPLIED PHYSICS

First Author:Wu, Li-fan; Zhang, Yu-ming; Lu, Hong-liang; Zhang, Yi-men

Indexed by:Article

Document Code:SCI WOS:000364283000003

Volume:54

Issue:11

ISSN No.:0021-4922

Translation or Not:no

Date of Publication:2015-01-01

Included Journals:SCI