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Threshold voltage engineering in GaN-based HEMT by using La2O3gate dielectric

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Affiliation of Author(s):微电子学院

Title of Paper:Threshold voltage engineering in GaN-based HEMT by using La2O3gate dielectric

Journal:Physica Status Solidi (C) Current Topics in Solid State Physics

Document Code:EI 20160801969532

Volume:13

Issue:5-6

Page Number:325-327

Translation or Not:no

Date of Publication:2016-01-01

Included Journals:EI

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