题 目：Particle Control for Clean Semiconductor Manufacturing: 1. Prevention of Particle Deposition on Critical Surfaces, 2. Resuspension of Deposited Particles from Filter and Flat Surfaces in Liquids, 3. Removing Deposited Particles by Air Jet Technique

时 间：2018年10月18日，下午14：30-15：30

地 点：南校区G楼118报告厅

主讲人：David Y. H. Pui教授

报告人简介

Professor David Y. H. Pui is a Distinguished McKnight University Professor and LM Fingerson/TSI Inc. Chair in Mechanical Engineering at the University of Minnesota. He is the Director of the Particle Technology Laboratory (PTL), and also the Director of the Center for Filtration Research (CFR) collaborating with 20 leading international filtration companies.He has a broad range of research experience in aerosol and nanoparticle science and filtration technology and has over 290 journal papers and 40 patents. He has developed several widely used commercial aerosol instruments and is a co-founder of Nanocopoeia for nano-formulation of pharmaceutical drugs. Dr. Pui has received many awards, including the Max Planck Research Award (1993), the Humboldt Research Award for Senior U.S. Scientists (2000), the Fuchs Memorial Award (2010) -- the highest disciplinary award conferred jointly by the American, German and Japanese Aerosol Associations, and the Einstein Professorship Award (2013) by the Chinese Academy of Sciences (CAS). Dr. Pui is a Member of the U.S. National Academy of Engineering (NAE).